Display device

ABSTRACT

A display device includes a substrate that includes a display area and a peripheral area, a transistor in the display area, a pixel electrode connected to the transistor, a common electrode that overlaps the pixel electrode, and an organic insulation layer that is between the common electrode and the substrate, and overlaps at least a part of the peripheral area, wherein a thickness of a portion of the organic insulation layer overlapping the display area, and a thickness of a portion of the organic insulation layer overlapping the peripheral area, are different from each other, and the organic insulation layer includes a valley that penetrates the organic insulation layer, while overlapping the peripheral area.

CROSS-REFERENCE TO RELATED APPLICATION(S)

This is a continuation application of U.S. patent application Ser. No.16/535,299 filed Aug. 8, 2019 (now pending), the disclosure of which isincorporated herein by reference in its entirety. U.S. patentapplication Ser. No. 16/535,299 claims priority benefit of Korean PatentApplication 10-2018-0140837 filed Nov. 15, 2018 in the KoreanIntellectual Property Office, the disclosure of which is incorporatedherein by reference in its entirety for all purposes.

BACKGROUND 1. Field

Embodiments relate to a display device.

2. Description of the Related Art

A display device includes a display panel, and the display panelincludes light emitting elements on a substrate and circuit elements fordriving the light emitting elements. The display panel may include anencapsulation substrate to help prevent permeation of external moistureor oxygen to thereby prevent the light emitting elements from beingdamaged due to the moisture or oxygen.

The above information disclosed in this Background section is only forenhancement of understanding of the background of the invention andtherefore it may contain information that does not form the prior artthat is already known in this country to a person of ordinary skill inthe art.

SUMMARY

Embodiments are directed to a display device that includes a substratethat includes a display area and a peripheral area, a transistor in thedisplay area, a pixel electrode connected to the transistor, a commonelectrode that overlaps the pixel electrode, and an organic insulationlayer that is between the common electrode and the substrate, andoverlaps at least a part of the peripheral area, wherein a thickness ofa portion of the organic insulation layer overlapping the display area,and a thickness of a portion of the organic insulation layer overlappingthe peripheral area, are different from each other, and the organicinsulation layer includes a valley that penetrates the organicinsulation layer, while overlapping the peripheral area.

The organic insulation layer overlapping the display area may have afirst height, the organic insulation layer overlapping the peripheralarea may have a second height, and the first height may be higher thanthe second height.

The first height may be about two times the second height.

The display device may include an encapsulation layer that is on thecommon electrode and overlaps the display area and the peripheral area,and the encapsulation layer may include a first inorganic layer and asecond inorganic layer and an organic layer between the first inorganiclayer and the second inorganic layer.

Touch lines may be on the encapsulation layer that overlaps theperipheral area, and a touch electrode may be on the encapsulation layerthat overlaps the display area.

One side of the encapsulation layer on which the touch lines aredisposed, and one side of the encapsulation layer on which the touchelectrode is disposed, may have a step difference.

The organic layer may be disposed in the valley.

The display device may further include a dam disposed in the peripheralarea, wherein a distance from the dam to an edge of the display area maybe greater than a distance from an edge of the organic layer to the edgeof the display area.

The transistor may further include a semiconductor layer on thesubstrate, a gate electrode overlapping the semiconductor layer, and asource electrode and a drain electrode that are connected to thesemiconductor layer, and the display device may further include a firstconnection member that is on the drain electrode and connecting thepixel electrode and the drain electrode.

The organic insulation layer may include a first organic insulationlayer that is between the source electrode and the first connectionmember and between the drain electrode and the first connection member.and a second organic insulation layer that is between the firstconnection member and the pixel electrode.

One area overlapping the display area and another area overlapping theperipheral area of at least one of the first organic insulation layerand the second organic insulation layer may have a thickness difference.

Embodiments are also directed to a display device that includes asubstrate that includes a display area and a peripheral area, atransistor in the display area, an organic insulation layer that is onthe transistor, a light emitting diode connected to the transistor, anencapsulation layer that is on the light emitting diode and includes anorganic layer, and touch lines and a touch electrode that are on theencapsulation layer, wherein the organic insulation layer includes avalley that overlaps the peripheral area and the organic layer isdisposed in the valley, and the organic insulation layer overlapping thedisplay area and the organic insulation layer overlapping the peripheralarea have a step difference.

The transistor may further include a semiconductor layer that is on thesubstrate. a gate electrode that overlaps the semiconductor layer. and asource electrode and a drain electrode that are connected to thesemiconductor layer, wherein the display device may further include afirst connection member that is on the drain electrode and connects thepixel electrode and the drain electrode.

The organic insulation layer may include a first organic insulationlayer that is between the source electrode and the first connectionmember and between the drain electrode and the first connection member.and a second organic insulation layer that is between the firstconnection member and the pixel electrode.

One area overlapping the peripheral area of at least one of the firstorganic insulation layer and the second organic insulation layer may bethinner than another area overlapping the display area.

The encapsulation layer may include a first inorganic layer, a secondinorganic layer, and an organic layer, wherein the organic layer may bebetween the first inorganic layer and the second inorganic layer.

Embodiments are also directed to a display device that includes asubstrate that includes a display area and a peripheral area. asemiconductor layer that is on the substrate that overlaps the displayarea. a gate electrode that overlaps the semiconductor layer. a sourceelectrode and a drain electrode that are connected to the semiconductorlayer. a first connection member that is on the drain electrode andconnected to the drain electrode. a pixel electrode that is on the firstconnection member and connected to the first connection member. anemission layer and a common electrode that overlap the pixel electrode.and an organic insulation layer that is between the common electrode andthe substrate, and overlaps at least a part of the peripheral area,wherein the organic insulation layer includes a valley that overlaps theperipheral area, and a power wire that is disposed in the peripheralarea overlaps the valley.

The display device may further include a second connection member thatis on the same layer as the first connection member, while beingdisposed in the peripheral area, and the second connection member mayoverlap the valley.

The organic insulation layer may include a first organic insulationlayer that is between the drain electrode and the first connectionmember. and a second organic insulation layer that is between the firstconnection member and the pixel electrode, and the first organicinsulation layer may include a first valley and the second organicinsulation layer may include a second valley.

The display device may further include an encapsulation layer that is onthe common electrode, wherein the encapsulation layer may include afirst inorganic layer and a second inorganic layer. and an organic layerbetween the first inorganic layer and the second inorganic layer, andthe organic layer is disposed in the second valley.

BRIEF DESCRIPTION OF THE DRAWINGS

Features will become apparent to those of skill in the art by describingin detail example embodiments with reference to the attached drawings inwhich:

FIG. 1 illustrates a schematic top plan view of a display deviceaccording to an example embodiment.

FIG. 2 illustrates a schematic cross-sectional view of FIG. 1, takenalong the line A-A′.

FIG. 3 illustrates a schematic cross-sectional view of FIG. 1, takenalong the line A-A′.

FIG. 4 illustrates a schematic cross-sectional view of FIG. 1, takenalong the line A-A′.

FIG. 5 illustrates a schematic cross-sectional view of FIG. 1, takenalong the line A-A′.

FIG. 6 illustrates an equivalent circuit diagram of a pixel of a displaydevice according to an example embodiment.

FIG. 7 illustrates a schematic cross-sectional view of the pixel of thedisplay device according to an example embodiment.

DETAILED DESCRIPTION

Example embodiments will now be described more fully hereinafter withreference to the accompanying drawings; however, they may be embodied indifferent forms and should not be construed as limited to theembodiments set forth herein. Rather, these embodiments are provided sothat this disclosure will be thorough and complete, and will fullyconvey example implementations to those skilled in the art. In thedrawing figures, the dimensions of layers and regions may be exaggeratedfor clarity of illustration. Like reference numerals refer to likeelements throughout.

It will be understood that when an element such as a layer, film,region, or substrate is referred to as being “on” another element, itmay be directly on the other element or intervening elements may also bepresent. In contrast, when an element is referred to as being “directlyon” another element, there are no intervening elements present. The word“on” or “above” means positioned on or below the object portion, anddoes not necessarily mean positioned on the upper side of the objectportion based on a gravitational direction.

In addition, unless explicitly described to the contrary, the word“comprise” and variations such as “comprises” or “comprising” will beunderstood to imply the inclusion of stated elements but not theexclusion of any other elements.

In addition, in this specification, the phrase “on a plane” meansviewing a target portion from the top, and the phrase “on across-section” means viewing a cross-section formed by verticallycutting a target portion from the side.

Hereinafter, a display device according to an example embodiment will bedescribed with reference to FIG. 1 and FIG. 2. FIG. 1 is a schematic topplan view of a display device according to an example embodiment, andFIG. 2 is a schematic cross-sectional view of FIG. 1, taken along theline A-A′.

Referring to FIG. 1, the display device according to the present exampleembodiment may include a driving unit that includes a display panel 10,a flexible printed circuit film 20 bonded to the display panel 10, andan IC chip 30.

The display panel 10 includes a display area DA that corresponds to ascreen where an image is displayed, and a peripheral area PA that isdisposed at the periphery of the display area DA. In FIG. 1, an innerside of the quadrangular single-dot chain line (-⋅-⋅-⋅-⋅-⋅-⋅-⋅-⋅-⋅-⋅)corresponds to the display area DA, and an outer side of the single-dotchain line corresponds to the peripheral area PA.

In the display area DA, pixels PX may be arranged in the form of, forexample, a matrix. Signal lines such as scan lines (gate lines), lightemission control lines, data lines, driving voltage lines, and the likemay be disposed in the display area DA. Each pixel PX may be connectedto a scan line, a light emission control line, a data line, and adriving voltage line. Each pixel PX may receive a scan signal (gatesignal), a light emission control signal, a data signal, and a drivingvoltage from the signal lines. Each pixel PX may include a lightemitting element, which may be an organic light emitting diode.

The display area DA may include a touch portion for sensing contact ornon-contact touch of a user.

In FIG. 1, the display area DA is illustrated as a rounded quadrangle asan example. The display area DA may have various shapes such as apolygon, a circle, an oval, and the like.

Circuits and/or signal lines may be disposed in the peripheral area PAto generate and/or transmit various signals applied to the display areaDA. In the present example embodiment, a pad portion PP is disposed inthe peripheral area PA of the display panel 10, and pads are formed inthe pad portion PP to receive external signals of the display panel 10.The pad portion PP may extend in a first direction (x-axis direction)along the periphery of one edge of the display panel 10. The flexibleprinted circuit film 20 may be bonded to the pad portion PP, and pads ofthe flexible printed circuit film 20 may be electrically connected tothe pads of the pad portion PP.

A driving unit that generates and/or processes various signals fordriving the display panel 10 may be disposed in the peripheral area PA.The driving unit may include a data driver that applies a data signal tothe data lines, an emission driver that applies an emission controlsignal to the emission control lines, and a signal controller thatcontrols a data driver, a scan driver, and the emission driver. The scandriver and the emission driver may be integrated with the display panel10, or may be disposed at left and right sides or at one side of thedisplay area DA. The data driver and the signal controller may beprovided as IC chips (driving IC chips) 30, and the IC chip 30 may beinstalled in the peripheral area PA of the display panel 10. The IC chip30 may be installed in the flexible printed circuit film, which may bebonded to the display panel 10 and thus electrically connected to thedisplay panel 10.

The display panel 10 may include an encapsulation layer EN that entirelycovers the display area DA. The encapsulation layer EN may preventpermeation of moisture or oxygen into the display panel 10 by sealingthe display area DA, and for example, prevent permeation of moisture oroxygen into light emitting elements. An edge of the encapsulation layerEN may be between an edge of the display panel 10 and the display areaDA.

A valley VA that surrounds the display area DA may be disposed in theperipheral area PA. The valley VA refers to an area where an organicinsulation layer (for example, a first organic insulation layer 181described in detail below in connection with valley V1) is removed. Anorganic insulation layer may be susceptible to moisture permeation.Thus, in the valley VA where the organic insulation layer is removed,moisture permeating along a part of the organic insulation layer may beprevented from passing into the display area DA.

The valley VA may be disposed along an edge of the display panel 10, andfor example, may be disposed along four edges of the display panel 10.Edges of the valley VA may be generally parallel to the edges of thedisplay panel 10.

The display panel 10 may include a bending region BR. The bending regionBR may be disposed in the peripheral area PA between the display area DAand the pad portion PP. The bending area BR may be disposed to cross thedisplay panel 10 in the first direction (x-axis direction). The displaypanel 10 may be bent with a predetermined curvature radius with respectto a bending axis that is parallel to the first direction (x-axisdirection) in the bending area BR. When the display panel 10 is a topemission type, the pad portion PP and the flexible printed circuit board20 that are disposed farther away from the display area DA than thebending area BR may be bent to be disposed behind the display panel 10.In an electronic device to which the display device is applied, thedisplay panel 10 may be in such a bent state. The bending area BR may bebent with respect to one bending axis, or may be bent with respect totwo or more bending axes. In the drawing, the bending area BR isdisposed in the peripheral area PA, but the bending area BR may bedisposed through the display area DA and the peripheral area PA or maybe disposed in the display area DA.

Hereinafter, a cross-sectional structure of a display panel 10 accordingto an example embodiment will be described in detail with reference toFIG. 2. FIG. 2 schematically shows a cross-section of an exampleembodiment at the periphery of the left edge of the display panel 10.The periphery of the right edge of the display panel 10 and theperiphery of the left edge of the display panel 10 may be substantiallysymmetrical to each other.

Referring to FIG. 2, the display area DA will be described, then theperipheral area PA will be described.

A substrate 110 includes the display area DA and the peripheral area PA,and a plurality of layers, wires, and elements are in the display areaDA. Although many pixels may be disposed in the display area DA of thedisplay panel 10, only one pixel will be illustrated to avoid complexityin the drawings. In addition, each pixel PX may include, for example,multiple transistors, a capacitor, and a light emitting element, but forclarity of explanation a stacking structure of the display panel 10 willbe described with particular reference to one transistor and one lightemitting element LED connected to the transistor.

The substrate 110 may be a flexible substrate or a rigid substrate. Thesubstrate 110 may include a polymer, for example, polyimide, polyamide,polycarbonate, polyethylene terephthalate, and the like, or glass,quartz, ceramic, and the like.

A barrier layer 115 may be on the substrate 110 and may help preventpermeation of external moisture or impurities. The barrier layer 115 mayinclude an inorganic insulation material such as a silicon oxide(SiO_(x)), a silicon nitride (SiN_(x)), and the like.

A buffer layer 120 may be on the barrier layer 115. The buffer layer 120may help block an impurity, which may be dispersed in a semiconductorlayer 130, from the substrate 110 during a process for forming thesemiconductor layer 130, and may reduce stress applied to the substrate110. The buffer layer 120 may include an inorganic insulation materialsuch as a silicon oxide, a silicon nitride, and the like.

The semiconductor layer 130 may be on the buffer layer 120. Thesemiconductor layer 130 may include a channel region 133 that overlaps agate electrode 124 a, a source region 131, and a drain region 132. Thesource region 131 and the drain region 132 disposed at opposite sides ofthe channel region 133 may each be doped with an impurity. Thesemiconductor layer 130 may include a polysilicon, an amorphous silicon,or an oxide semiconductor.

A first insulation layer 141 that includes an inorganic insulationmaterial such as a silicon oxide, a silicon nitride, and the like, or anorganic insulation material, may be on the semiconductor layer 130. Thefirst insulation layer 141 may include a portion serving as a first gateinsulation layer.

A first gate conductor, which may include the scan lines and the gateelectrode 124 a of the transistor, may be on the first insulation layer141. The first gate conductor may include a metal such as molybdenum(Mo), copper (Cu), aluminum (Al), silver (Ag), chromium (Cr), tantalum(Ta), titanium (Ti), and the like, or a metal alloy thereof.

A second insulation layer 142 may be on the first insulation layer 141and the first gate conductor. The second insulation layer 142 mayinclude an inorganic insulation material such as a silicon oxide, asilicon nitride, and the like, or an organic insulation material. Thesecond insulation layer 142 include a portion serving as a second gateinsulation layer.

A second gate conductor such as a storage line including a storageelectrode 124 b may be on the second insulation layer 142. The secondgate conductor may include a metal such as molybdenum (Mo), copper (Cu),aluminum (Al), silver (Ag), chromium (Cr), tantalum (Ta), titanium (Ti),and the like, or a metal alloy thereof.

A third insulation layer 160 may be on the second gate conductor. Thethird insulation layer 160 may include an inorganic insulation materialsuch as a silicon oxide, a silicon nitride, and the like, or an organicinsulation material.

A first data conductor, which may include data lines, a driving voltageline, a power wire 178, a source electrode 173 of the transistor, and adrain electrode 175 of the transistor, may be on the third insulationlayer 160.

The source electrode 173 and the drain electrode 175 may be respectivelyconnected to the source region 131 and the drain region 132 of thesemiconductor layer 130 through contact holes formed in the thirdinsulation layer 160, the second insulation layer 142, and the firstinsulation layer 141.

The first data conductor may include a metal such as aluminum (Al),copper (Cu), silver (Ag), gold (Au), platinum (Pt), palladium (Pd),nickel (Ni), molybdenum (Mo), tungsten (W), titanium (Ti), chromium(Cr), tantalum (Ta), and the like, or a metal alloy thereof. The dataconductor may be a multilayer such as titanium/aluminum/titanium(Ti/Al/Ti), titanium/copper/titanium (Ti/Cu/Ti), ormolybdenum/aluminum/molybdenum (Mo/Al/Mo).

The gate electrode 124 a, the source electrode 173, and the drainelectrode 175 form a transistor, together with the semiconductor layer130. In the transistor illustrated in the drawing, the gate electrode124 a is disposed above the semiconductor layer 130, but the structureof the transistor may be variously modified.

The above-noted first organic insulation layer 181 may be on the thirdinsulation layer 160 and the first data conductor (i.e., on the powerwire 178, the source electrode 173, and the drain electrode 175). Thefirst organic insulation layer 181 may include an organic insulatingmaterial, for example, a polyimide, an acryl-based polymer, asiloxane-based polymer, and the like, and may also include an inorganicinsulating material.

As described in detail below, a portion of the first organic insulationlayer 181 in the peripheral area PA may include a first valley V1 inwhich some of the first organic insulation layer 181 is removed.

A second data conductor, which may include a first connection member177, a driving control signal line 179, and a second connection member188, may be on the first organic insulation layer 181.

The first connection member 177 may connect the drain electrode 175 anda pixel electrode 191, which will be described below. The firstconnection member 177 reduces resistance between the drain electrode 175and the pixel electrode 191 such that a light emitting element that maybe driven at a high frequency, while having high luminance, may beprovided.

A second organic insulation layer 182 may be on the second dataconductor and the first organic insulation layer 181. The second organicinsulation layer 182 may include an organic insulating material, and mayinclude, for example, a polyimide, an acryl-based polymer, and the like.

The pixel electrode 191 of the light emitting diode LED may be on thesecond organic insulation layer 182. The pixel electrode 191 may beconnected to the first connection member 177 through a contact holeformed in the second organic insulation layer 182, and may be connectedto the drain electrode 175 through the first connection member 177.

The pixel electrode 191 may include a metal such as silver (Ag), nickel(Ni), gold (Au), platinum (Pt), aluminum (Al), copper (Cu),aluminum-neodymium (AlNd), aluminum-nickel-lanthanum (AlNiLa), and thelike, or a metal alloy thereof. Alternatively, the pixel electrode 191may include a transparent conductive material such as indium tin oxide(ITO), indium zinc oxide (IZO), and the like. The pixel electrode 191may be a multilayer such as ITO/Ag/ITO, ITO/Al, and the like.

A barrier rib 360 having an opening that overlaps the pixel electrode191 may be on the second organic insulation layer 182. The opening ofthe barrier rib 360 may define each pixel area. The barrier rib 360 mayserve as a pixel defining layer. The barrier rib 360 may include anorganic insulating material or an inorganic insulating material.

An emission layer 370 may be disposed on the pixel electrode 191 tooverlap the opening defined by the barrier rib 360.

A common electrode 270 may be on the emission layer 370. The commonelectrode 270 may be formed of a thin metal having a low work functionsuch as calcium (Ca), barium (Ba), magnesium (Mg), aluminum (Al), silver(Ag), and the like, such that the common electrode 270 has a property oflight transmission. The common electrode 270 may include a transparentconductive material such as ITO, IZO, and the like.

The pixel electrode 191, the emission layer 370, and the commonelectrode 270 of each pixel form a light emitting diode LED such as anorganic light emitting diode.

An encapsulation layer EN may be on the common electrode 270 and mayencapsulate the light emitting diode LED to help prevent permeation ofexternal moisture or oxygen. The encapsulation layer EN may cover theentire area of the display area DA, and edges of the encapsulation layermay be disposed in the peripheral area.

The encapsulation layer EN may include a structure in which one or moreinorganic layers and one or more organic layers are stacked. In someexample embodiments, the encapsulation layer EN may include a firstinorganic layer 391, an organic layer 392, and a second inorganic layer393. In the encapsulation layer EN, the first inorganic layer 391 andthe second inorganic layer 393 may help prevent permeation of moistureand the like, and the organic layer 392 may planarize a surface of theencapsulation layer EN, for example, a top surface of the encapsulationlayer EN.

The first inorganic layer 391 and the second inorganic layer 393 mayinclude an inorganic insulation material such as a silicon oxide, asilicon nitride, and the like. The organic layer 392 may include anorganic material such as acrylic resin, a methacrylic resin, apolyisoprene, a vinyl resin, an epoxy resin, a urethane resin, acellulose resin, and a perylene resin.

Although it is not illustrated in the present specification, apolarization layer may be on the encapsulation layer EN to reducereflection of external light.

A touch electrode TP for sensing a touch may be on the second inorganiclayer 393 of the encapsulation layer EN. The touch electrode TP may bebetween the encapsulation layer EN and the polarization layer. The touchelectrode TP may be formed in the shape of a plurality of blocks, andmay include a transparent conductive material such as ITO and the like,or may include a metal mesh.

The touch electrode TP according to an example embodiment may bedirectly on the encapsulation layer EN rather than being attached to anadditionally provided touch panel. Compared to a case of additionallymanufacturing a touch panel and attaching a touch electrode to the touchpanel, a process for forming the touch electrode TP may be simplifiedand a light-weight and thin display device may be provided.

Hereinafter, constituent elements disposed in the peripheral area PAwill be described. The constituent elements disposed in the peripheralarea PA may be explained in connection with the components disposed inthe display area DA, and duplicated explanations may be partiallyomitted.

The substrate 110, the barrier layer 115, the buffer layer 120, thefirst insulation layer 141, the second insulation layer 142, and thethird insulation layer 160, which are respectively extended from thedisplay area DA, may be sequentially stacked in the peripheral area PA.

An edge of the first insulation layer 141, an edge of the secondinsulation layer 142, and an edge of the third insulation layer 160 maybe overlapped with each other. For example, the edge of the firstinsulation layer 141, the edge of the second insulation layer 142, andthe edge of the third insulation layer 160 may be substantially aligned.

The edge of the first insulation layer 141, the edge of the secondinsulation layer 142, and the edge of the third insulation layer 160 maybe disposed inside the edge of the substrate 110. Thus, the edge of thefirst insulation layer 141, the edge of the second insulation layer 142,and the edge of the third insulation layer 160 may be disposed closer tothe display area DA than the edge of the substrate 110.

In the peripheral area PA, a crack dam CD may be disposed at the edge ofthe first insulation layer 141, the edge of the second insulation layer142, and the edge of the third insulation layer 160. The crack dam CDmay help to prevent spread of cracks, which may occur in an inorganicinsulation layer such as the barrier layer 115, the buffer layer 120,and the like when the display panel 10 is cut corresponding to the edgeof the substrate 110. The crack dam CD may be formed of an organicmaterial, and for example, may be formed of the same material in thesame process as at least one of the first organic insulation layer 181,the second organic insulation layer 182, and the barrier rib 360.

The crack dam CD may cover at least one edge of the first insulationlayer 141, the second insulation layer 142, and the third insulationlayer 160. In another implementation, the crack dam CD may not overlapthe first insulation layer 141, the second insulation layer 142, and thethird insulation layer 160.

A power wire 178 may be on a portion of the third insulation layer 160,disposed in the peripheral area PA. The power wire 178 may be on thesame layer as the source electrode 173 and the drain electrode 175disposed in the display area DA. The power wire 178 may be formed of thesame material in the same process as the first data conductor thatincludes the source electrode 173 and the drain electrode 175.

The power wire 178 may transmit a power voltage having a predeterminedlevel, which may be applied to the light emitting diode LED, and maytransmit, for example, a common voltage ELVSS. The power wire 178 may beelectrically connected to the pad portion PP through a first end and asecond end thereof, and may surround the display area DA.

The first organic insulation layer 181 may be on the power wire 178 andthe third insulation layer 160.

The first organic insulation layer 181 that overlaps the peripheral areaPA may include the above-noted first valley V1. The first valley V1refers to an area from which the first organic insulation layer 181 isremoved. The first valley V1 may block a movement path through which thefirst organic insulation layer 181 is introduced from outside thesubstrate 110 to help prevent permeation of moisture into the displayarea DA.

The first valley V1 may penetrate, for example, completely penetrate,the first organic insulation layer 181. The first valley V1 may have aheight that is substantially the same as a thickness of the firstorganic insulation layer 181.

The driving control signal line 179 and the second connection member 188may be on a portion of the first organic insulation layer 181,overlapping the peripheral area PA. The driving control signal line 179and the second connection member 188 may be on the same layer as thefirst connection member 177 that is disposed in the display area DA. Thedriving control signal line 179 and the second connection member 188 maybe formed through the same process as the first connection member 177,and may include the same material as the first connection member 177.

The driving control signal line 179 may transmit signals such as avertical start signal, a clock signal, and the like, and signals thatprovide a low voltage of a specific level to a scan driver and/or alight emitting driver which may be disposed in a driving circuit area inthe peripheral area PA.

The second connection member 188 may be on the first organic insulationlayer 181, and may be connected to the power wire 178. A part of thefirst organic insulation layer 181, overlapping the power wire 178, maybe removed for connection between the second connection member 188 andthe power wire 178.

The second organic insulation layer 182 may be on the first organicinsulation layer 181, the driving control signal line 179, and thesecond connection member 188.

A thickness of the second organic insulation layer 182 disposed in theperipheral area PA may be different from a thickness of the secondorganic insulation layer 182 disposed in the display area DA. The secondorganic insulation layer 182 overlapping the display area DA may have afirst height h1 and the second organic insulation layer 182 disposed inthe peripheral area PA may have a second height h2. In the presentexample embodiment, the first height h1 may be higher than the secondheight h2, and for example, the first height h1 may be about two timesthe height h2. One side (for example, a top surface) of the secondorganic insulation layer 182 disposed in the peripheral area PA and oneside (for example, a top surface) of the second organic insulation layer182 disposed in the display area DA may have a step difference.

The second organic insulation layer 182 having a plurality of areas,each having a different height, may be formed through a single process,and for example, may be formed by using a half-tone mask.

The second organic insulation layer 182 may include a second valley V2.The second valley V2 refers to an area from which the second organicinsulation layer 182 is removed. The second valley V2 may block amovement path of moisture or a foreign particle moving through thesecond organic insulation layer 182 or the first organic insulationlayer 181 from the outside to thereby prevent permeation of the externalmoisture or foreign particle into the display area DA.

The second valley V2 may penetrate, for example, completely penetrate,the second organic insulation layer 182 disposed in the peripheral areaPA. The second valley V2 may have a height that is substantially thesame as a thickness of the second organic insulation layer 182 disposedin the peripheral area PA. The second valley V2 may have the same heightas the second height h2.

In some example embodiments, the first valley V1 and the second valleyV2 may overlap each other. An edge of the first valley V1 and an edge ofthe second valley V2 may be aligned, while overlapping each other. Whenthe first valley V1 and the second valley V2 are substantiallyoverlapped with each other, they may be regarded as a single valley.

A third connection member 198 that is on the same layer as the pixelelectrode 191 may be on the second organic insulation layer 182. Thethird connection member 198 may be formed of the same material throughthe same process as the pixel electrode 191.

The third connection member 198 may be connected to the power wire 178through the second connection member 188. The third connection member198 may be connected to the common electrode 270 that overlaps thedisplay area DA. The power wire 178 may be connected to the commonelectrode 270 through the third connection member 198 and the secondconnection member 188. When the power wire 178 transmits a commonvoltage ELVSS as a power voltage, the common electrode 270 may receivethe common voltage ELVSS.

The third connection member 198 on the second organic insulation layer182 may have a patterned shape. In the present example embodiment, thethird connection member 198 and the driving control signal line 179 maynot be substantially overlapped with each other along a Z-axisdirection. The driving control signal line 179 may also have a patternedshape, and may be disposed in an area that does not overlap the thirdconnection member 198. The third connection member 198 and the drivingcontrol signal line 179 may be disposed to be misaligned with or offsetfrom each other. In a plane view, the third connection member 198 andthe driving control signal line 179 may be disposed in misaligned areas,and thus entirely form a planar shape. Since the third connection member198 and the driving control signal 179 are misaligned, a signal that isgenerated from a lower portion but unnecessary in touch lines may beshielded.

The third connection member 198 may be disposed in the first valley V1and the second valley V2. The third connection member 198 may have ashape that penetrates the first organic insulation layer 181 and thesecond organic insulation layer 182. When the first valley V1 and thesecond valley V2 are filled with a material other than an organicmaterial (like the third connection member 198), moisture or a foreignparticle moved along the organic insulation layer may be prevented frompermeating into the display area DA.

At least one of dams D1 and D2 may be disposed in the peripheral areaPA. The dams D1 and D2 may be on the third insulation layer 160.

The dams D1 and D2 may prevent an organic material having fluidity (likea monomer used in a process for forming the organic layer 392 of theencapsulation layer EN) from overflowing. Thus, the edge of the organiclayer 392 of the encapsulation layer EN may be substantially more insidethan the dams D1 and D2, and for example may be disposed inside thefirst dam D1. The edge of the organic layer 392 may be between the damsD1 and D2 and the display area DA. The edge of the organic layer 392 maybe disposed closer to the display area DA than the edges of the dams D1and D2.

The dams D1 and D2 may include at least one layer. The dams D1 and D2may be formed by using the organic insulation layer, the inorganicinsulation layer, or the barrier rib disposed in the display area DA.

The first dam D1 according to an example embodiment may include onelayer. In the present example embodiment, the first dam D1 may be formedof the same material through the same process as the second organicinsulation layer 182. The first dam D1 may be formed of the samematerial through the same process as the barrier rib 360.

The second dam D2 according to an example embodiment may include aplurality of layers. The second dam D2 may include at least one of alayer formed of the same material through the same process as the firstorganic insulation layer 181, a layer formed of the same materialthrough the same process as the second organic insulation layer 182, anda layer formed of the same material through the same process as thebarrier rib 360.

The encapsulation layer EN extended from the display area DA may bedisposed in the peripheral area PA. The first inorganic layer 391 andthe second inorganic layer 393 included in the encapsulation layer ENmay extend near an edge of the peripheral area PA, in which the thirdinsulation layer 160 is disposed. The first inorganic layer 391 and thesecond inorganic layer 393 of the encapsulation layer EN may extend overthe dams D1 and D2, thereby covering them. In the present exampleembodiment, a contact area of the first inorganic layer 391 and thesecond inorganic layer 393 is increased, and accordingly, a bondingforce between the first inorganic layer 391 and the second inorganiclayer 393 may be increased.

The edge of the organic layer 392 may be between the first dam D1 andthe valleys V1 and V2. The organic layer 392 may be formed at a locationthat does not exceed the first dam D1, while filling the valleys V1 andV2. The organic layer 392 may be disposed in the valleys V1 and V2.

The organic layer 392 may be formed of an organic material such as amonomer or a reaction product thereof. The organic material may flowinto the first valley V1 and the second valley V2 during a process forforming the organic layer 392. A height of the second valley V2 may bedetermined by a thickness of the second organic insulation layer 182,and according to the example embodiment, a thickness of the secondorganic insulation layer 182 disposed in the peripheral area PA may bethinner than a thickness of the second organic insulation layer 182disposed in the display area DA, and accordingly the height of thesecond valley V2 may be lowered. Thus, the organic material providedduring the process for forming the organic layer 392 may have an edgethat is between the first dam D1 and the valleys V1 and V2, whilesufficiently filling the first valley V1 and the second valley V2.According to the present example embodiment, the organic layer 392 mayhave a flat top surface.

As compared to the above-described example embodiment, if the height ofthe second valley V2 in the peripheral area PA is substantially the sameas the thickness of the second inorganic insulation layer 182 in thedisplay area DA, a significant amount of organic material may berequired to fill the first and second valleys V1 and V2. In this case,the organic material may not flow to the periphery of the first dam D1after filling the first and second valleys V1 and V2, or may notcompletely fill the first and second valleys V1 and V2. Accordingly, thetop surface of the organic layer 392 may be recessed such that theorganic layer 392 may not have a flat top surface. The touch lines TLconnected to a touch electrode TP may be on the top surface of theorganic layer 392, and it may not be easy to form the touch lines TL ifthe top surface of the organic layer 392 is not planarized, and ashort-circuit failure may occur.

The plurality of touch lines TL that are connected to the touchelectrode TP disposed in the display area DA may be on a top surface ofthe encapsulation layer EN. The touch lines TL are connected to thetouch electrode TP and transmit a touch sense signal. The touch lines TLmay be formed of the same material through the same process as the touchelectrode TP, or may be formed of a different material through adifferent process from the touch electrode TP.

According to the present example embodiment, the touch lines TL disposedin the peripheral area PA and the touch electrode TP disposed in thedisplay area DA may have a step difference. Thus, one side of theencapsulation layer EN, in which the touch lines TL are disposed, andone side of the encapsulation layer EN, in which the touch electrode TPis disposed, may have a step difference.

A protection film (not shown) disposed below the substrate 110 may befurther included. The protection film may be attached to a rear side ofthe display panel by using an adhesive, or may be formed through acoating process without using the adhesive. The protection film mayinclude a plastic such as polyethylene terephthalate, polyethylenenaphthalate, a polyimide, polyethylene sulfide, and the like.

Hereinafter, display devices according to various example embodimentswill be described respectively with reference to FIG. 3 to FIG. 5. FIG.3 is a cross-sectional view of an example embodiment of FIG. 1, takenalong the line A-A′, FIG. 4 is a cross-sectional view of an exampleembodiment of FIG. 1, taken along the line A-A′, and FIG. 5 is across-sectional view of an example embodiment of FIG. 1, taken along theline A-A′. Constituent elements disposed in display areas DA shown inFIG. 3 to FIG. 5 are the same as those described with reference to FIG.2, and therefore a description will be omitted.

First, referring to FIG. 3, a substrate 110, a barrier layer 115, abuffer layer 120, a first insulation layer 141, a second insulationlayer 142, a the third insulation layer 160 extended from a display areaDA may be sequentially stacked in a peripheral area PA.

The first insulation layer 141, the second insulation layer 142, and thethird insulation layer 160 may be aligned at their edges. For example,the edge of first insulation layer 141, the edge of the secondinsulation layer 142, and the edge of the third insulation layer 160 maybe overlapped with each other.

In the peripheral area PA, the crack dam CD may be disposed at the edgesof the first insulation layer 141, the second insulation layer 142, andthe third insulation layer 160. The crack dam CD may prevent spread ofcracks which may occur in an inorganic insulation layer such as thebarrier layer 115, the buffer layer 120, and the like when the displaypanel 10 is cut corresponding to the edge of the substrate 110. Thecrack dam CD may be formed of an organic material or an inorganicmaterial, and for example, may be formed of the same material in thesame process as at least one of the first organic insulation layer 181,the second organic insulation layer 182, and the barrier rib 360.

A power wire 178 may be on a portion of the third insulation layer 160,disposed in the peripheral area PA. The power wire 178 may be on thesame layer as the source electrode 173 and the drain electrode 175disposed in the display area DA. The power wire 178 may be formed of thesame material in the same process as the first data conductor thatincludes the source electrode 173 and the drain electrode 175.

The power wire 178 may transmit a power voltage having a predeterminedlevel, which may be applied to the light emitting diode LED, and maytransmit, for example, a common voltage ELVSS.

A first organic insulation layer 181 is on the power wire 178 and thethird insulation layer 160. A thickness of the first organic insulationlayer 181 that overlaps the peripheral area PA and a thickness of thefirst organic insulation layer 181 that overlaps the display area DA maybe different from each other. For example, the first organic insulationlayer 181 overlapping the display area DA may have a third height h3,the first organic insulation layer 181 overlapping the peripheral areaPA may have a fourth height h4, and the third height h3 may be higherthan the fourth height h4. For example, the third height h3 may be abouttwo times the fourth height h4.

The first organic insulation layer 181 having a plurality of areas, eachhaving a different height, may be formed through a single process, andfor example, may be formed by using a half-tone mask.

The first organic insulation layer 181 that overlaps the peripheral areaPA may include the first valley V1 in which the first organic insulationlayer 181 is removed. The first valley V1 may block a movement paththrough which the first organic insulation layer 181 is introduced fromoutside the substrate 110 to help prevent permeation of moisture intothe display area DA.

The first valley V1 may have a height that is substantially the same asa thickness of the first organic insulation layer 181 disposed in theperipheral area PA. The first valley V1 may have substantially the sameheight as the fourth height h4.

A driving control signal line 179 and a second connection member 188 maybe on the first organic insulation layer 181. The driving control signalline 179 and the second connection member 188 may be on the same layeras the first connection member 177 that is disposed in the display areaDA. The driving control signal line 179 and the second connection member188 may be formed through the same process as the first connectionmember 177, and may include the same material as the first connectionmember 177.

The second connection member 188 may be on the first organic insulationlayer 181, and may be connected to the power wire 178. A part of thefirst organic insulation layer 181, overlapping the power wire 178, maybe removed for connection between the second connection member 188 andthe power wire 178.

A second organic insulation layer 182 may be on the driving controlsignal line 179 and the second connection member 188. In various exampleembodiments, a thickness of the second organic insulation layer 182overlapping the display area DA and a thickness of the second organicinsulation layer 182 overlapping the peripheral area PA may besubstantially equal to each other. When the thickness of the secondorganic insulation layer 182 overlapping the display area DA is a firstheight h1 and the thickness of the second organic insulation layer 182overlapping the peripheral area PA is a second height h2, the firstheight h1 and the second height h2 may be substantially equal to eachother. Substantial equality not only implies complete equality but alsoimplies that there may be a slight difference depending, for example, onprocess errors.

The second organic insulation layer 182 may include the second valley V2in which the second organic insulation layer 182 is removed. The secondvalley V2 may block a movement path of moisture and the like introducedthrough the second organic insulation layer 182 from outside thesubstrate 110 to help prevent permeation of external moisture into thedisplay area DA.

In various example embodiments, the first valley V1 and the secondvalley V2 may overlap each other. An edge of the first valley V1 and anedge of the second valley V2 may be aligned, while overlapping eachother.

A third connection member 198 that is on the same layer as the pixelelectrode 191 may be on the second organic insulation layer 182. Thethird connection member 198 may be connected to the power wire 178through the second connection member 188, and the third connectionmember 198 may be connected to the common electrode 270 that overlapsthe display area DA. The power wire 178 may be connected to the commonelectrode 270 through the third connection member 198 and the secondconnection member 188. When the power wire 178 transmits a commonvoltage ELVSS as a power voltage, the common electrode 270 may receivethe common voltage ELVSS.

The third connection member 198 may be disposed in the first valley V1and the second valley V2. The third connection member 198 may have ashape that penetrates the first organic insulation layer 181 and thesecond organic insulation layer 182. When the first valley V1 and thesecond valley V2 are filled with a material other than an organicmaterial (like the third connection member 198), moisture or a foreignparticle may be prevented from permeating into the display area DA.

At least one of dams D1 and D2 may be disposed in the peripheral areaPA. The dams D1 and D2 may be on the third insulation layer 160.

The dams D1 and D2 may prevent an organic material having fluidity (likea monomer used in a process for forming the organic layer 392 of theencapsulation layer EN) from overflowing. The edge of the organic layer392 of the encapsulation layer EN may be substantially more inside thanthe dams D1 and D2, and for example may be disposed inside the first damD1. The edge of the organic layer 392 may be between the dams D1 and D2and the display area DA.

The encapsulation layer EN extended from the display area DA may bedisposed in the peripheral area PA. The first inorganic layer 391 andthe second inorganic layer 393 included in the encapsulation layer ENmay extend near an edge of the peripheral area PA, in which the thirdinsulation layer 160 is disposed.

The edge of the organic layer 392 included in the encapsulation layer ENmay be between the first dam D1 and the valleys V1 and V2. The organiclayer 392 may be formed at a location that is close to the first dam D1,while filling the valleys V1 and V2.

The organic layer 392 may be formed using an organic material such as amonomer. The organic material may flow into the first valley V1 and thesecond valley V2 during a process for forming the organic layer 392. Aheight of the first valley V1 is determined by a thickness of the firstorganic insulation layer 181, and according to the example embodiment, athickness of the first organic insulation layer 181 disposed in theperipheral area PA is thinner than a thickness of the first organicinsulation layer 181 disposed in the display area DA, and accordinglythe height of the first valley V1 may be lowered. Thus, the organicmaterial provided during the process for forming the organic layer 392may have an edge that is between the first dam D1 and the valleys V1 andV2, while sufficiently filling the first valley V1 and the second valleyV2. According to the present example embodiment, the organic layer 392and the encapsulation layer EN including the organic layer 392 may haveflat top surfaces.

A plurality of touch lines TL that are connected to the touch electrodeTP may be on a top surface of the encapsulation layer EN. Since thetouch lines TL are formed on a significantly flat top surface, they maybe stably formed.

If the height of the first valley V1 is substantially the same as thethickness of the first inorganic insulation layer 181 disposed in thedisplay area DA, a significant amount of organic material may berequired to fill the first and second valleys V1 and V2. In this case,the organic material may not be sufficient enough to flow to theperiphery of the first dam D1, or may not completely fill the firstvalley V1 and the second valley V2. Accordingly, the top surface of theorganic layer 392 may be recessed such that the organic layer 392 maynot have a flat top surface. The touch lines TL connected to a touchelectrode TP may be on the top surface of the organic layer 392, and itmay be easy to form the touch wires TL if the top surface of the organiclayer 392 is not planarized, and a short-circuit failure may occur.

Next, referring to FIG. 4, the substrate 110, the barrier layer 115, thebuffer layer 120, the first insulation layer 141, the second insulationlayer 142, and the third insulation layer 160, which are respectivelyextended from the display area DA, may be sequentially stacked in theperipheral area PA.

In the peripheral area PA, the crack dam CD may be disposed at the edgeof the first insulation layer 141, the edge of the second insulationlayer 142, and the edge of the third insulation layer 160. The crack damCD may prevent spread of cracks, which may occur in an inorganicinsulation layer such as the barrier layer 115, the buffer layer 120,and the like when the display panel 10 is cut corresponding to the edgeof the substrate 110.

The power wire 178 may be on a portion of the third insulation layer160, disposed in the peripheral area PA. The power wire 178 may be onthe same layer as the source electrode 173 and the drain electrode 175disposed in the display area DA. The power wire 178 may be formed of thesame material in the same process as the first data conductor thatincludes the source electrode 173 and the drain electrode 175.

The power wire 178 may transmit a power voltage having a predeterminedlevel, which may be applied to the light emitting diode LED, and maytransmit, for example, a common voltage ELVSS.

The first organic insulation layer 181 may be on the power wire 178 andthe third insulation layer 160. A thickness of the first organicinsulation layer 181 disposed in the peripheral area PA may be differentfrom a thickness of the first organic insulation layer 181 disposed inthe display area DA. For example, the first organic insulation layer 181overlapping the display area DA may have a third height h3, and thefirst organic insulation layer 181 overlapping the peripheral area PAmay have a fourth height h4. In the present example embodiment, thethird height h3 may be higher than the fourth height h4, and forexample, the third height h3 may be about two times the fourth heighth4.

The first organic insulation layer 181 having a plurality of areas, eachhaving a different height, may be formed through a single process, andfor example, may be formed by using a half-tone mask.

The first organic insulation layer 181 that overlaps the peripheral areaPA may include the first valley V1, in which the first organicinsulation layer 181 is removed.

The first valley V1 may have a height that is substantially the same asa thickness of the first organic insulation layer 181 disposed in theperipheral area PA. The first valley V1 may have substantially the sameheight as the fourth height h4.

The driving control signal line 179 and the second connection member 188may be on the first organic insulation layer 181. The driving controlsignal line 179 and the second connection member 188 may be on the samelayer as the first connection member 177 that is disposed in the displayarea DA. The driving control signal line 179 and the second connectionmember 188 may be formed through the same process as the firstconnection member 177, and may include the same material as the firstconnection member 177.

The second connection member 188 may be on the first organic insulationlayer 181, and may be connected to the power wire 178. A part of thefirst organic insulation layer 181, overlapping the power wire 178, maybe removed for connection between the second connection member 188 andthe power wire 178.

The second organic insulation layer 182 may be on the driving controlsignal line 179 and the second connection member 188.

A thickness of the second organic insulation layer 182 overlapping thedisplay area DA and a thickness of the second organic insulation layer182 overlapping the peripheral area PA may be different from each other.The thickness of the second organic insulation layer 182 disposed in theperipheral area PA may be smaller than the thickness of the secondorganic insulation layer 182 disposed in the display area DA. The secondorganic insulation layer 182 overlapping the display area DA may have afirst height h1, and the second organic insulation layer 182 disposed inthe peripheral area PA may have a second height h2. In the presentexample embodiment, the first height h1 may be higher than the secondheight h2, and for example, the first height h1 may be about two timesthe second height h2.

The second organic insulation layer 182 having a plurality of areas,each having a different height, may be formed through a single process,and for example, may be formed by using a half-tone mask.

The second organic insulation layer 182 may include the second valleyV2. The second valley V2 may have a height that is substantially thesame as a thickness of the second organic insulation layer 182 disposedin the peripheral area PA, and for example, the second valley V2 mayhave the second height h2. The second valley V2 refers to an area fromwhich the second organic insulation layer 182 is removed.

In various example embodiments, the first valley V1 and the secondvalley V2 may overlap each other. An edge of the first valley V1 and anedge of the second valley V2 may be aligned, while overlapping eachother.

The third connection member 198 that is on the same layer as the pixelelectrode 191 may be on the second organic insulation layer 182. Thethird connection member 198 may be formed of the same material throughthe same process as the pixel electrode 191.

The third connection member 198 may be connected to the power wire 178through the second connection member 188, and the third connectionmember 198 may be connected to the common electrode 270 that overlapsthe display area DA. The power wire 178 may be connected to the commonelectrode 270 through the third connection member 198 and the secondconnection member 188. When the power wire 178 transmits a commonvoltage ELVSS as a power voltage, the common electrode 270 may receivethe common voltage ELVSS.

The third connection member 198 may be disposed in the first valley V1and the second valley V2. The third connection member 198 may have ashape that penetrates the first organic insulation layer 181 and thesecond organic insulation layer 182. When the first valley V1 and thesecond valley V2 are filled with a material other than an organicmaterial (like the third connection member 198), moisture or a foreignparticle may be prevented from permeating into the display area DA.

The encapsulation layer EN may include the first inorganic layer 391,the organic layer 392, and the second inorganic layer 393. In thepresent example embodiment, an edge of the organic layer 392 may bebetween the first dam D1 and the valleys V1 and V2. The organic layer392 may be formed at a location that is adjacent to the first dam D1,while filling the valleys V1 and V2.

The organic layer 392 may be formed using an organic material such as amonomer. The organic material may flow into the first valley V1 and thesecond valley V2 during a process for forming the organic layer 392. Aheight of the first valley V1 may be determined by the thickness of thefirst organic insulation layer 181, and a height of the second valley V2may be determined by the thickness of the second organic insulationlayer 182. According to the present example embodiment, the thickness ofthe first organic insulation layer 181 disposed in the peripheral areaPA is thinner than the thickness of the first organic insulation layer181 disposed in the display area DA, and accordingly the height of thefirst valley V1 may be lowered. Similarly, the thickness of the secondorganic insulation layer 182 disposed in the peripheral area PA isthinner than the thickness of the second organic insulation layer 182disposed in the display area DA, and accordingly the height of thesecond valley V2 may be lowered. Thus, the organic material providedduring the process for forming the organic layer 392 may have an edgethat is between the first dam D1 and the valleys V1 and V2, whilesufficiently filling the first valley V1 and the second valley V2.According to the present example embodiment, the organic layer 392 mayhave a flat top surface.

A plurality of touch lines TL that are connected to the touch electrodeTP may be on a top surface of the encapsulation layer EN.

When the height of the first valley V1 is substantially the same as thethickness of the first inorganic insulation layer 181 and the secondorganic insulation layer 182 disposed in the display area DA, asignificant amount of organic material may be required to fill the firstand second valleys V1 and V2. In this case, the organic material may notbe sufficient to flow to the periphery of the first dam D1, or may notcompletely fill the first valley V1 and the second valley V2.Accordingly, the top surface of the organic layer 392 may be recessedsuch that the organic layer 392 may not have a flat top surface. Thetouch lines TL connected to a touch electrode TP may be on the topsurface of the organic layer 392, and it may not be easy to form thetouch wires TL if the top surface of the organic layer 392 is notplanarized, and a short-circuit failure may occur.

Next, referring to FIG. 5, the substrate 110, the barrier layer 115, thebuffer layer 120, the first insulation layer 141, the second insulationlayer 142, and the third insulation layer 160, which are respectivelyextended from the display area DA, may be sequentially stacked in theperipheral area PA.

In the peripheral area PA, the crack dam CD may be disposed at the edgeof the first insulation layer 141, the edge of the second insulationlayer 142, and the edge of the third insulation layer 160. The crack damCD may prevent spread of cracks, which may occur in an inorganicinsulation layer such as the barrier layer 115, the buffer layer 120,and the like when the display panel 10 is cut corresponding to the edgeof the substrate 110. The crack dam CD may be formed of an organicmaterial, and for example, may be formed of the same material throughthe same process as at least one of the first organic insulation layer181, the second organic insulation layer 182, and the barrier rib 360.

The power wire 178 may be on a portion of the third insulation layer160, disposed in the peripheral area PA. The power wire 178 may be onthe same layer as the source electrode 173 and the drain electrode 175disposed in the display area DA. The power wire 178 may be formed of thesame material in the same process as the first data conductor thatincludes the source electrode 173 and the drain electrode 175.

The power wire 178 may transmit a power voltage having a predeterminedlevel, which may be applied to the light emitting diode LED, and maytransmit, for example, a common voltage ELVSS.

The first organic insulation layer 181 may be on the power wire 178 andthe third insulation layer 160.

The first organic insulation layer 181 overlapping the peripheral areaPA may include the first valley V1, in which the first organicinsulation layer 181 is removed. The first valley V1 may block amovement of moisture introduced through the first organic insulationlayer 181 to help prevent permeation of moisture into the display areaDA.

The power wire 178 according to the present example embodiment mayextend toward the display area DA, and for example, the power wire 178may be partially overlapped with the first valley V1. The first valleyV1 may partially expose the power wire 178.

The driving control signal line 179 and the second connection member 188may be on the first organic insulation layer 181. The driving controlsignal line 179 and the second connection member 188 may be on the samelayer as the first connection member 177 that is disposed in the displayarea DA. The driving control signal line 179 and the second connectionmember 188 may be formed through the same process as the firstconnection member 177, and may include the same material as the firstconnection member 177.

The second connection member 188 may be on the first organic insulationlayer 181, and may be connected to the power wire 178. A part of thefirst organic insulation layer 181, overlapping the power wire 178, maybe removed for connection between the second connection member 188 andthe power wire 178. In an implementation, the second connection member188 may be connected to the power wire 178 through the first valley V1,and this part of the first organic insulation layer 181 may not beremoved in an example embodiment.

The second connection member 188 may be disposed in the first valley V1.The second connection member 188 may extend toward the display area DA,while filling the first valley V1. The second connection member 188 maybe connected to the power wire 178 through the first valley V1.

The second organic insulation layer 182 may be on the driving signalcontrol line 179 and the second connection member 188. The secondorganic insulation layer 182 may include the second valley V2, in whichthe second organic insulation layer 182 is removed.

In various example embodiments, the first valley V1 and the secondvalley V2 may overlap each other. The first valley V and the secondvalley V2 may be aligned at their edges, while overlapping each other.

The third connection member 198 that is on the same layer as the pixelelectrode 191 may be on the second organic insulation layer 182. Thethird connection member 198 may be formed of the same material throughthe same process as the pixel electrode 191.

The third connection member 198 may be connected to the power wire 178through the second connection member 188, and the third connectionmember 198 may be connected to the common electrode 270 that overlapsthe display area DA. The power wire 178 may be connected to the commonelectrode 270 through the third connection member 198 and the secondconnection member 188. When the power wire 178 transmits a commonvoltage ELVSS as a power voltage, the common electrode 270 may receivethe common voltage ELVSS.

The third connection member 198 may be disposed in the first valley V1and the second valley V2. The third connection member 198 may have ashape that penetrates the first organic insulation layer 181 and thesecond organic insulation layer 182. The third connection member 198 maycontact the second connection member 188 in the first valley V1 and thesecond valley V2. The third connection member 198 is connected to thesecond connection member 188 through the second valley V2, and thesecond connection member 188 is connected to the power wire 178 throughthe first valley V1 and thus may transmit a common voltage.

The first valley V1 and the second valley V2 may be mostly filled with amaterial other than an organic material like the second connectionmember 188 and the third connection member 198. Thus, moisture or aforeign particle may be prevented from permeating into the display areaDA by the first and second valleys V1 and V2.

At least one of dams D1 and D2 may be disposed in the peripheral areaPA. The dams D1 and D2 may prevent an organic material having fluidity(like a monomer used in a process for forming the organic layer 392 ofthe encapsulation layer EN) from overflowing. Thus, the edge of theorganic layer 392 of the encapsulation layer EN may be substantiallymore inside than the dams D1 and D2, and for example may be disposedinside the first dam D1.

The edge of the organic layer 392 may be between the dams D1 and D2 andthe display area DA. The edge of the organic layer 392 may be betweenthe first dam D1 and the valleys V1 and V2. The organic layer 392 mayextend to a location adjacent to the first dam D1, while filling thevalleys V1 and V2.

The organic layer 392 may be formed using an organic material such as amonomer. The organic material may flow into the first valley V1 and thesecond valley V2 during a process for forming the organic layer 392. Inthe present example embodiment, the first valley V1 is in a state ofbeing filled by the second connection member 188, and the second valleyV2 is in a state of being filled by the third connection member 198.Thus, the organic material provided during the process for forming theorganic layer 392 may have an edge that is between the first dam D1 andthe valleys V1 and V2, while sufficiently filling the first valley V1and the second valley V2 even with a small amount. The organic layer 392formed on such a structure may have a planarized top surface.

A plurality of touch lines TL that are connected to the touch electrodeTP may be on a top surface of the encapsulation layer EN.

Hereinafter, a display area of a display device according to the presentexample embodiment will be described with reference to FIG. 6 and FIG.7. FIG. 6 is a circuit diagram of one pixel of a display deviceaccording to the present example embodiment, and FIG. 7 is a schematiccross-sectional view of the pixel of the display device according to theexample embodiment.

First, referring to FIG. 6, the pixel PX may be an area partitioned by aplurality of signal lines 121, 171, and 172. The pixel PX may be aminimum unit for displaying an image. The display device displays animage by using a plurality of pixels.

The signal lines may include a plurality of gate lines 121 transmittinga gate signal (or a scan signal), a plurality of data lines 171transmitting a data signal, and a plurality of driving voltage lines 172transmitting a driving voltage ELVDD. In the present example embodiment,the data line 171 and the driving voltage line 172 are included in adata conductor, and the gate line 121 will be called a gate conductor.

The gate lines 121 may extend substantially in a row direction andgenerally in parallel to each other, and vertical direction portions ofthe data lines 171 and the driving voltage lines 172 may extendsubstantially in a column direction and generally in parallel to eachother.

Each pixel PX may include a switching thin film transistor Qs, a drivingthin film transistor Qd, a storage capacitor Cst, and a light emittingdiode LED. Each pixel PX may further include a transistor and acapacitor for compensation of a current supplied to the light emittingdiode LED.

In the present example embodiment, the switching thin film transistor Qstransmits a data signal applied to the data line 171 to the driving thinfilm transistor Qd in response to a scan signal applied to the gate line121. The driving thin film transistor Qd flows an output current ILD ofwhich magnitude varies depending on a voltage applied between a controlterminal and an output terminal. The capacitor Cst charges a data signalapplied to the control terminal of the driving thin film transistor Qd,and maintains the charging of the data signal even after the switchingthin film transistor Qs is turned off.

In the present example embodiment, the light emitting diode LED includesan anode connected to the output terminal of the driving thin filmtransistor Qd and a cathode connected to a common voltage ELVSS. Thelight emitting diode LED displays an image by changing intensityaccording to the output current ILD of the driving thin film transistorQd.

Next, referring to FIG. 7, an interlayered structure of an area wherethe storage capacitor, the driving thin film transistor, and the likeare disposed will be described. A repeated description of similarfeatures provided with reference to FIG. 2 may be omitted in thefollowing description.

The barrier layer 115 may be on the substrate 110 to help preventpermeation of externally introduced moisture or a foreign particle. Thebuffer layer 120 may be on the barrier layer 115. The buffer layer 120may block an impurity, which may spread to the semiconductor layer 130from the substrate 110 during a process for forming the semiconductorlayer 130, and may reduce a stress applied to the substrate 110. Each ofthe barrier layer 115 and the buffer layer 120 may include an inorganicinsulation material such as a silicon oxide, a silicon nitride, and thelike.

The semiconductor layer 130 may be on the buffer layer 120. Thesemiconductor layer 130 may include the channel region 133 that overlapsa gate electrode 124 a, the source region 131, and the drain region 132.In the present example embodiment, the source region 131 and the drainregion 132 are respectively disposed at opposite sides of the channelregion 133 and are doped with an impurity. The semiconductor layer 130may include a polysilicon, an amorphous silicon, or an oxidesemiconductor.

The first insulation layer 141 that includes an inorganic insulationmaterial such as a silicon oxide, a silicon nitride, and the like, or anorganic insulation material, may be on the semiconductor layer 130. Thefirst insulation layer 141 may also be referred to as a first gateinsulation layer.

A first gate conductor that includes a scan line and the gate electrode124 a of the transistor may be on the first insulation layer 141.

The second insulation layer 142 may be on the first insulation layer 141and the first gate conductor. The second insulation layer 142 mayinclude an inorganic insulation material such as a silicon oxide, asilicon nitride, and the like, or an organic insulation material. Thesecond insulation layer 142 may also be referred to as a second gateinsulation layer.

A second gate conductor such as a storage line that includes a storageelectrode 124 b may be on the second insulation layer 142. The gateelectrode 124 a and the storage electrode 124 b may form the storagecapacitor described with reference to FIG. 6.

The third insulation layer 160 may be on the second gate conductor. Thethird insulation layer 160 may include an inorganic insulation materialsuch as a silicon oxide, a silicon nitride, and the like, or an organicinsulation material.

A first data conductor that includes a data line, the first drivingvoltage line 172, and the source electrode 173 and the drain electrode175 of a transistor may be on the third insulation layer 160.

Each of the source electrode 173 and the drain electrode 175 may beconnected to the source region 131 and the drain region 132 of thesemiconductor layer 130 through contact holes formed in the insulationlayer 160, the second insulation layer 142, and the first insulationlayer 141, respectively.

In the present example embodiment, the gate electrode 124 a, the sourceelectrode 173, and the drain electrode 175 form a transistor, togetherwith the semiconductor layer 130. In the transistor shown in thedrawing, the gate electrode 124 a is disposed above the semiconductorlayer 130, but a structure of the transistor may be variously modified.

The first organic insulation layer 181 may be on the third insulationlayer 160 and the first data conductor. The first organic insulationlayer 181 may include an organic insulation material, and for example,may include may include a polyimide, an acryl-based polymer, asiloxane-based polymer, and the like.

A second data conductor that includes the first connection member 177and the second driving voltage line 177 b may be on the first organicinsulation layer 181.

The first connection member 177 may connected the drain electrode 175and the pixel electrode 191. The second driving voltage line 177 b maybe connected to the first driving voltage line 172 and may transmit adriving voltage. The second driving voltage line 177 b may reduceresistance by being connected to the first driving voltage line 172, andmay provide a high-luminance and high-frequency display panel.

In the present example embodiment, the second organic insulation layer182 is on the second data conductor and the first organic insulationlayer 181. The second organic insulation layer 182 may include anorganic insulating material, and may include, for example, a polyimide,an acryl-based polymer, and the like.

The pixel electrode 191 of the light emitting diode LED may be on thesecond organic insulation layer 182. The pixel electrode 191 may beconnected to the first connection member 177 through a contact holeformed in the second organic insulation layer 182, and may be connectedto the drain electrode 175 through the first connection member 177.

The barrier rib 360 having an opening that overlaps the pixel electrode191 may be on the second organic insulation layer 182. An opening of thebarrier rib 360 may define each pixel area. The barrier rib 360 may bereferred to as a pixel defining layer. The barrier rib 360 may includean organic insulating material or an inorganic insulating material.

In the present example embodiment, the emission layer 370 is on thepixel electrode 191 that overlaps the opening of the barrier rib 360,and a common electrode 270 is on the emission layer 370.

In the present example embodiment, the pixel electrode 191, the emissionlayer 370, and the common electrode 270 of each pixel form a lightemitting diode LED such as an organic light emitting diode. The displaydevice may have a structure of any one of a front display type, a reardisplay type, and a one panel dual display type, depending upon thelight-emitting direction of the light emitting diode LED.

Above the common electrode, as previously described with reference toFIG. 2, an encapsulation layer and a touch electrode may be sequentiallydisposed.

By way of summation and review, instead of sealing light emittingelements by using an encapsulation substrate, an encapsulation layer maybe formed on the light emitting elements, which may reduce the weight ofthe display panel, and reduce the possibility of damage to the displaypanel. Most of the display panel may be a display area that emits animage, but a specific area of the display panel, for example, an edgearea of the display panel, may be a peripheral area where a drivingcircuit, a signal line, and the like are disposed.

Embodiments may provide a display panel in which an organic layer of anencapsulation layer disposed in a peripheral area may have a flat topsurface. Accordingly, touch lines formed on the encapsulation layer maybe stably formed. Thus, a display device with improved reliability maybe provided. Embodiments may provide a display device in which a topsurface of an encapsulation layer disposed in a peripheral area, forexample, an organic layer included in the encapsulation layer, may bemade to be flat, which may help enable formation of touch lines on theencapsulation layer.

DESCRIPTION OF SYMBOLS

-   -   DA: display area    -   PA: peripheral area    -   110: substrate    -   191: pixel electrode    -   270: common electrode

Example embodiments have been disclosed herein, and although specificterms are employed, they are used and are to be interpreted in a genericand descriptive sense only and not for purpose of limitation. In someinstances, as would be apparent to one of ordinary skill in the art asof the filing of the present application, features, characteristics,and/or elements described in connection with a particular embodiment maybe used singly or in combination with features, characteristics, and/orelements described in connection with other embodiments unless otherwisespecifically indicated. Accordingly, it will be understood by those ofskill in the art that various changes in form and details may be madewithout departing from the spirit and scope of the present invention asset forth in the following claims.

What is claimed is:
 1. A display device, comprising: a substrate thatincludes a display area and a peripheral area; a transistor in thedisplay area; a first electrode electrically connected to thetransistor; a second electrode that overlaps the first electrode; and anorganic insulation layer that is between the first electrode and thesubstrate, and overlaps at least a part of the peripheral area, a valleypenetrating the organic insulation layer and overlapping the peripheralarea; a first metal layer that is under the organic insulation layer andoverlapping the valley; and a second metal layer and a third metal layerat least partially disposed in the valley; wherein the first and secondmetal layers directly contact each other, and the second and third metallayers directly contact each other.
 2. The display device as claimed inclaim 1, wherein the transistor further includes: a semiconductor layeron the substrate; a gate electrode overlapping the semiconductor layer;and a source electrode and a drain electrode that are connected to thesemiconductor layer, wherein the display device further comprises afirst connection member that is on the drain electrode and connects thefirst electrode and the drain electrode.
 3. The display device asclaimed in claim 2, wherein the first metal layer is disposed on thesame layer as the source electrode.
 4. The display device as claimed inclaim 2, wherein the second metal layer is disposed on the same layer asthe first connection member.
 5. The display device as claimed in claim2, wherein the third metal layer is disposed on the same layer as thefirst electrode.
 6. The display device as claimed in claim 2, whereinthe organic insulation layer includes: a first organic insulation layerthat is between the source electrode and the first connection member andbetween the drain electrode and the first connection member; and asecond organic insulation layer that is between the first connectionmember and the first electrode.
 7. The display device as claimed inclaim 6, wherein a part of the first organic insulation layer isdisposed between the first metal layer and the second metal layer. 8.The display device as claimed in claim 6, wherein a part of the secondorganic insulation layer is disposed between the second metal layer andthe third metal layer.
 9. The display device as claimed in claim 1,wherein the display device further comprises an encapsulation layer thatis on the second electrode and overlaps the display area and theperipheral area, and the encapsulation layer includes: a first inorganiclayer and a second inorganic layer; and an organic layer between thefirst inorganic layer and the second inorganic layer.
 10. The displaydevice as claimed in claim 9, wherein touch lines are on theencapsulation layer that overlaps the peripheral area, and a touchelectrode is on the encapsulation layer overlaps the display area. 11.The display device as claimed in claim 10, wherein one side of theencapsulation layer on which the touch lines are disposed and one sideof the encapsulation layer on which the touch electrode is disposed havea step difference.
 12. The display device as claimed in claim 9, whereinthe organic layer is disposed in the valley.
 13. The display device asclaimed in claim 9, further comprising a dam disposed in the peripheralarea, wherein a distance from the dam to an edge of the display area isgreater than a distance from an edge of the organic layer to the edge ofthe display area.
 14. The display device of claim 6, wherein the organicinsulation layer comprises: the first organic insulation layercomprising a first valley; and the second organic insulation layercomprising a second valley.
 15. The display device of claim 1, furthercomprising an encapsulation layer that is disposed on the secondelectrode, wherein the encapsulation layer comprises: a first inorganiclayer and a second inorganic layer; and an organic layer disposedbetween the first inorganic layer and the second inorganic layer, andthe organic layer is disposed in the second valley.
 16. The displaydevice of claim 1, wherein a thickness of a portion of the organicinsulation layer overlapping the display area, and a thickness of aportion of the organic insulation layer overlapping the peripheral area,are different from each other.